|Currently at Northwestern University|
My focus is on UV-curable nanoimprint lithography and the applications of this fabrication technology. I have worked on the development of a device that possesses the ability to perform nanoimprinting on a 1"x1" substrate, as well as integrate with an optical aligner for alignment functionality. This technology provides a means to create high-resolution (less than 100 nm), multi-layered patterns with relatively high throughput and low expense. I intend to seek out new and interesting applications of nanoimprint lithography, as well as explore possible solutions to alleviate its current limitations.
University of California, Berkeley
B.S., Mechanical Engineering, 2001
University of California, Los Angeles
M.S., Mechanical Engineering, 2005
- C. Stuart, Q. Xu, R. J. Tseng, Y. Yang, H. T. Hahn, Y. Chen, W. Wu, and R. S. Williams, "Nanofabrication module integrated with optical aligner," J. Vac. Sci. Technol. B 24 (2), 539-542, March 2006.
44-116C Engineering IV
420 Westwood Plaza
Los Angeles, CA 90095